Customization is okay! We offer quick responses and after-sales support unique to manufacturers.
The "RCA Wafer Cleaning System" is an automatic cleaning device primarily based on the RCA cleaning method, widely adopted as a highly reliable cleaning method.
With a "3-axis multi-joint clean robot" for wafer transport and "FOUP" used for loaders and unloaders, it achieves cleaning in a non-particle environment.
【Features】
■ Quick response from estimates to customization
■ Support for our own equipment as well as other manufacturers' equipment
■ Detailed response to sudden specification changes
*For more details, please download the catalog or contact us.
【Exhibition Information】
SEMICON Japan
Location: Tokyo Big Sight
Period: December 13-15, 2017
Booth Number: 3509, East Hall